× |
|
Materials
-
Material:
Silicon
-
Diameter:
[100]
-
Dopant:
Boron
-
Growth Method:
CZ
-
Orientations:
p-type Si:B
-
Resistivity:
1-20
-
Thickness:
4"
-
Surface:
525
-
Grade:
SEMITEST (Spotted defect) - wafers with three layers of SiO2 and Ge deposited by Electron Beam Evaporation,2Flats, Empak cst
-
Delivery Time:
15-30 days
|
$50.00 |
|
$50.00 |
× |
|
Materials
-
Material:
Silicon
-
Diameter:
76.2mm
-
Type:
P
-
Dopant:
Phos
-
Growth Method:
CZ
-
Orientations:
(111)
-
Resistivity:
1-100
-
Thickness:
4900-5100µm
-
Surface:
P/E
-
Grade:
PRIME
-
Delivery Time:
15-30 days
|
$100.00 |
|
$100.00 |
× |
|
Materials
-
Material:
Silicon
-
Diameter:
[100]
-
Type:
P/P
-
Dopant:
Boron
-
Growth Method:
CZ
-
Orientations:
n-type Si:P
-
Resistivity:
1-5
-
Thickness:
3"
-
Surface:
381
-
Grade:
SEMI Prime, 1Flat, TTV<5µm,Bow/Warp<10µm,Empak cst
-
Delivery Time:
15-30 days
|
$130.00 |
|
$130.00 |
|