× |
|
Materials
-
Material:
Silicon
-
Diameter:
[100]
-
Dopant:
Boron
-
Growth Method:
CZ
-
Orientations:
p-type Si:B
-
Resistivity:
1-20
-
Thickness:
4"
-
Surface:
525
-
Grade:
SEMITEST (Spotted defect) - wafers with three layers of SiO2 and Ge deposited by Electron Beam Evaporation,2Flats, Empak cst
-
Delivery Time:
15-30 days
|
$50.00 |
|
$50.00 |
× |
|
Materials
-
Material:
Silicon
-
Diameter:
[100]
-
Type:
P/P
-
Dopant:
Boron
-
Growth Method:
CZ
-
Orientations:
p-type Si:B
-
Resistivity:
FZ1-30
-
Thickness:
6"
-
Surface:
625
-
Grade:
SEMI Prime, 1Flat (57.5mm), wiith LaserMark, Empak cst
-
Delivery Time:
15-30 days
|
$110.00 |
|
$110.00 |
× |
|
Materials
-
Material:
Silicon
-
Diameter:
[100]
-
Type:
P/P
-
Dopant:
Boron
-
Growth Method:
CZ
-
Orientations:
n-type Si:P
-
Resistivity:
5-35
-
Thickness:
6"
-
Surface:
700
-
Grade:
SEMI Prime, 1Flat(57.5mm),TTV<5µm, TIR<1µm, Bow<10µm, Warp<20µm,Empak cst
-
Delivery Time:
15-30 days
|
$150.00 |
|
$150.00 |
|